Optical microlithography XXII (24-27 February 2009, San Jose, California, United States)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 2 vol, 2, isbn 978-0-8194-7527-5 0-8194-7527-0Conference Proceedings

Advances in OPC Technology and Development of ZOPC ToolXIAOLANG YAN; ZHENG SHI; YE CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 68271U.1-68271U.14, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Achieving overlay budgets for double patterningHAZELTON, Andrew J; MAGOME, Nobutaka; WAKAMOTO, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72740X.1-72740X.11, 2Conference Paper

Scanner-dependent Optical Proximity EffectsTYMINSKI, Jacek K; MATSUYAMA, Tomoyuki; NAKASHIMA, Toshiharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72740U.1-72740U.9, 2Conference Paper

Computational Lithography : The New Enabler of Moore's LawSINGH, Vivek.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 68271Q.1-68271Q.5, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

New approach to determine best beam focusZUNIGA, Christian; TAWFIK, Tamer M.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72742S.1-72742S.10, 2Conference Paper

Optical microlithography: some analytical resultsBABU, S. V; BAROUCH, E.Journal of imaging science. 1989, Vol 33, Num 6, pp 193-199, issn 8750-9237Article

Double-Patterning-Friendly OPCXIAOHAI LI; LUK-PAT, Gerry; CORK, Chris et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 727414.1-727414.12, 2Conference Paper

Extreme-UV sources are on track for next-generation chip manufacturingKINCADE, Kathy.Laser focus world. 2003, Vol 39, Num 2, pp 55-60, issn 1043-8092, 5 p.Article

Capacitive focusing method for microlithographyNITZAN, M; BRODER, J; EISENBERG, N et al.Optical engineering (Bellingham. Print). 1988, Vol 27, Num 7, pp 512-514, issn 0091-3286Article

Optical microlithography XXIII (23-25 February 2010, San Jose, California, United States)Dusa, Mircea V; Conley, Willard.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 2 vol, 2, isbn 978-0-8194-8054-5 0-8194-8054-1Conference Proceedings

Implementing and Validating Double Patterning in 22 nm to 16 nm Product-Design and Patterning FlowsNOH, Myung-Soo; SEO, Beom-Seok; LEE, Suk-Joo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76400S.1-76400S.11, 2Conference Paper

Bare wafer metrology challenges in microlithography at 45 nm node and beyondCHUNSHENG HUANG.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 682723.1-682723.15, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Advanced aberration control in projection optics for double patterningYOSHIHARA, Toshiyuki; SUKEGAWA, Takashi; YABU, Nobuhiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741L.1-72741L.9, 2Conference Paper

Process Step Reduction at Negative Tone Spacer Patterning Technique Using Developer Soluble Bottom ARCJUNG, Woo-Yung; EOM, Jae-Doo; JEON, Sung-Min et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72740F.1-72740F.11, 2Conference Paper

Design of Resist Stacks with Antireflection Coatings from the Viewpoint of Focus BudgetNAGAI, Satoshi; SATO, Kazuya.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741H.1-72741H.10, 2Conference Paper

Analysis of Property of HSQ in Electron Beam LithographyMIN ZHAO; XIAOLI ZHU; BAOQIN CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 682728.1-682728.6, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Slope-integrated methodology for OPC model calibrationLIANG ZHU; LU, Mark; KING, Dion et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 682725.1-682725.8, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Signal synthesis for diffractive optical elements in hybrid systemsBRAUER, R; WYROWSKI, F; BRYNGDAHL, O et al.Applied optics. 1991, Vol 30, Num 23, pp 3307-3314, issn 0003-6935Article

Exploration of Linear and Non-Linear Double Exposure Techniques by SimulationPETERSEN, John S; GREENWAY, Robert T; FÜHNER, Tim et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741V.1-72741V.13, 2Conference Paper

Multiple Layer CD Control TreatmentBIRNSTEIN, Anka; RÖPKE, Christoph; SCZYRBA, Martin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 727422.1-727422.12, 2Conference Paper

OPC Segmentation: Dilemma between Degree-of-Freedom and Stability with Some RelievesTANG, Y. P; FENG, J. H; CHIH, M. H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72742G.1-72742G.10, 2Conference Paper

Impact of source polarization on the imaging of line and space features at 45nm half pitch nodeZHOU YUAN; YANQIU LI.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 68271P.1-68271P.8, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Layout optimization for thick-film resist overlay metrologyLIANG ZHU; LI, James; ZHOU, Brian et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 682726.1-682726.8, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Lithography Options for the 32nm Half Pitch Node and Their Implications on Resist and Material TechnologyGRONHEID, Roel; HENDRICKX, Eric; WIAUX, Vincent et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 68271V.1-68271V.10, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper